DocumentCode :
2679710
Title :
X and Ku Band High Efficiency Power GaAs FETs
Author :
Saito, A. ; Kojima, Y. ; Suzuki, K. ; Kaneko, Y. ; Aihara, S.
fYear :
1983
fDate :
May 31 1983-June 3 1983
Firstpage :
265
Lastpage :
267
Abstract :
New structual, high productive power GaAs FETs have been developed, achieving power added efficiency ranging from 30 % to 40 % with 1.5 W power output between 10 to 15.2 GHz on mass production basis. Internally matched devices with two chips have exhibited the supreme performance of 3 W power output with as high as 40 % power added efficiency at 15.2 GHz. These devices have structual features on the 0.5 µm deep recessed gate utilizing photoresist-free gate formation and the sidewall metallization combined with PHS and via hole structure.
Keywords :
Breakdown voltage; FETs; Fabrication; Gallium arsenide; Inductance; Mass production; Metallization; Optimized production technology; Productivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 1983 IEEE MTT-S International
Conference_Location :
Boston, MA, USA
ISSN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.1983.1130879
Filename :
1130879
Link To Document :
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