Title :
Application of HF solutions for the cleaning of TiSi2 surface
Author :
Baklanov, M.R. ; Vanhaelemeersch, S. ; Maex, K.
Author_Institution :
IMEC
Keywords :
Contact resistance; Electrical resistance measurement; Etching; Hafnium; Inorganic materials; Optical films; Silicides; Surface cleaning; Surface resistance; Thickness measurement;
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
DOI :
10.1109/MAM.1998.887531