DocumentCode :
2680361
Title :
Application of HF solutions for the cleaning of TiSi2 surface
Author :
Baklanov, M.R. ; Vanhaelemeersch, S. ; Maex, K.
Author_Institution :
IMEC
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
110
Lastpage :
112
Keywords :
Contact resistance; Electrical resistance measurement; Etching; Hafnium; Inorganic materials; Optical films; Silicides; Surface cleaning; Surface resistance; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887531
Filename :
887531
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680361
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