DocumentCode :
2680419
Title :
Formation of ultra-thin PtSi layers with a 2-step silicidation process
Author :
Donaton, R.A. ; Jin, S. ; Bender, H. ; Maex, K. ; Vantomme, A. ; Langouche, G.
Author_Institution :
IMEC
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
118
Lastpage :
119
Keywords :
Atomic force microscopy; Inorganic materials; Metallization; Silicidation; Silicides; Silicon; Sputter etching; Sputtering; Thickness control; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887534
Filename :
887534
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680419
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