DocumentCode
2685032
Title
The application of advanced techniques for complex focused-ion-beam device modification
Author
Abramo, M.T. ; Hahn, L.L.
Author_Institution
IBM Microelectronics Division
fYear
1996
fDate
1996
Firstpage
1775
Lastpage
1778
Keywords
Aluminum; CMOS technology; Circuits; Conductive films; Insulation; Milling machines; Semiconductor films; Silicon compounds; Sputtering; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability of Electron Devices, Failure Physics and Analysis, 1996. Proceedings of the 7th European Symposium on
Print_ISBN
0-7803-3369-1
Type
conf
DOI
10.1109/ESREF.1996.888213
Filename
888213
Link To Document