Title :
Technology for field emission pressure sensors
Author :
Angelescu, A. ; Kleps, Irina ; Pavelescu, I. ; Nicolaescu, D. ; Nedelcu, O. ; Avram, Marioara ; Samfirescu, N. ; Miu, Mihaela
Author_Institution :
Nat. Inst. for Res. & Dev. in Microtechnol., Bucharest, Romania
Abstract :
The technological process for the fabrication of a novel field emission pressure sensor is presented. The silicon microprocessed device integrates a field emission microtriode array and a membrane anode. The sensor works in a differential mode and is intended for low-pressure measurements
Keywords :
electron field emission; elemental semiconductors; etching; membranes; micromachining; microsensors; photolithography; pressure sensors; silicon; triodes; vacuum microelectronics; Si; anisotropic etching; differential mode; field emission microtriode array; field emission pressure sensor; gated emitters; low-pressure measurements; membrane anode; membrane thickness dependence; photolithography; silicon microprocessed device; square section diaphragm; Anodes; Biomembranes; FETs; Field emitter arrays; Gas detectors; Pressure measurement; Sensor arrays; Silicon; Thickness measurement; Voltage;
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
DOI :
10.1109/SMICND.2000.889126
