Title :
A novel etching-oxidation fabrication method for 3D nano structures on silicon and its application to SOI symmetric waveguide and 3D taper spot size converter
Author :
Li, Ling-Han ; Higo, Akio ; Kubota, Masanori ; Sugiyama, Masakazu ; Nakano, Yoshiaki
Author_Institution :
Res. Center for Adv. Sci. & Technol., Tokyo Univ., Tokyo
Abstract :
A novel etching and oxidation method utilizing space effect of dry etching for three dimensional silicon structure is presented. Testing devices of SOI symmetric waveguide with ultra thick SiO2 cladding and silicon waveguide structure integrated with 3D taper spot size converter are fabricated using this method.
Keywords :
claddings; elemental semiconductors; etching; nanotechnology; optical waveguides; oxidation; silicon; silicon-on-insulator; 3D nanostructures; 3D taper spot size converter; SOI symmetric waveguide; Si; SiO2; SiO2 cladding; etching; oxidation; silicon waveguide; space effect; Dry etching; Lithography; Optical coupling; Optical device fabrication; Optical waveguides; Oxidation; Shape; Silicon; Space technology; Testing; Spot size converter; Sub micron etching and oxidation; Symmetric SOI waveguide; Ultra thick SiO2 layer;
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
DOI :
10.1109/OMEMS.2008.4607811
