• DocumentCode
    2697499
  • Title

    Impact of an air barrier on the electron states of etch-released quantum heterostructures

  • Author

    Makowski, Jan D. ; Saarinen, M.J. ; Palmstrom, C.J. ; Talghader, Joseph J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Minnesota, Minneapolis, MN
  • fYear
    2008
  • fDate
    11-14 Aug. 2008
  • Firstpage
    184
  • Lastpage
    185
  • Abstract
    This work investigates the effect of the quantum well interface on the photoluminescence (PL) spectrum. The samples consist of an MBE (molecular beam epitaxy) grown InP/InGaAs heterostructure with two sets of a multiquantum well structure (MQW) and a single quantum well (SQW) symmetrically placed around a sacrificial layer. All are attached to a common anchor where the heterostructure is still in its pristine state; only the bottom heterostructure is present in the exposed well region next to the cantilevers. The transfer matrix method yields transition wavelengths for the SQW in the unprocessed buried case and exposed case. The electron states in the MQW structure form a mini band at the top of the quantum well and are not affected by the nature of the interface.
  • Keywords
    III-V semiconductors; band structure; energy gap; gallium arsenide; indium compounds; molecular beam epitaxial growth; photoluminescence; semiconductor quantum wells; transfer function matrices; InP-InGaAs; air barrier; cantilevers; electron states; etch-released quantum heterostructures; molecular beam epitaxy; multiquantum well structure; photoluminescence; quantum well interface; single quantum well; transfer matrix method; Electrons; Etching; III-V semiconductor materials; Indium phosphide; Optical materials; Passivation; Photoluminescence; Quantum computing; Quantum well devices; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
  • Conference_Location
    Freiburg
  • Print_ISBN
    978-1-4244-1917-3
  • Electronic_ISBN
    978-1-4244-1918-0
  • Type

    conf

  • DOI
    10.1109/OMEMS.2008.4607890
  • Filename
    4607890