DocumentCode :
2699264
Title :
Temperature dependence simulation of electrophysical properties of silicon carbide
Author :
Agueev, Oleg A. ; Svetlichny, Alexander M. ; Izotovs, Denis A. ; Melnikov, Alexander V. ; Voronko, Andrey B.
Author_Institution :
Dept. of Microelectron. & ULSIC Technol, Taganrog State Univ. of Radio Eng., Rostov-Don, Russia
fYear :
2000
fDate :
2000
Firstpage :
295
Lastpage :
298
Abstract :
At this work was calculated the temperature dependences of Fermi level situation, carrier concentration and conductivity in SiC polytypes (3C, 4H, 6H) for different impurities concentration and type of conductivity for the wide temperature range. The calculations were carried out with the help of numerical solution of equation electroneutrality. We took into account the multicharging of impurities and compensating impurity influence. The results of calculations helped to make precise temperature dependences of Fermi level situation, carrier concentration and conductivity of SiC and to raise calculations accuracy for simulation characteristics of SiC of electronic devices and analyse experimental data of CV characteristics, DLTS and noise diagnostics
Keywords :
Fermi level; carrier density; deep levels; electrical conductivity; impurity states; silicon compounds; wide band gap semiconductors; CV characteristics; DLTS; Fermi level; Fermi level situation; SiC; SiC polytypes; carrier concentration; compensating impurity influence; conductivity; electroneutrality; electrophysical properties; multicharging; noise diagnostics; temperature dependence simulation; Accuracy; Analytical models; Conductivity; Data analysis; Equations; Impurities; Noise level; Silicon carbide; Temperature dependence; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
Conference_Location :
Smolenice
Print_ISBN :
0-7803-5939-9
Type :
conf
DOI :
10.1109/ASDAM.2000.889504
Filename :
889504
Link To Document :
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