DocumentCode
2707993
Title
New methods for measuring resistance and charge decay of worksurfaces
Author
Uchida, Hideki ; Kurosaki, Hiroshi ; Numaguchi, Toshi
Author_Institution
Tech. Dept., Sumitomo 3M Ltd., Kanagawa, Japan
fYear
2000
fDate
26-28 Sept. 2000
Firstpage
152
Lastpage
160
Abstract
All microelectronic components are increasingly small, lightweight, thin, and short. This paper considers how to provide a better static control worksurface for the manufacturing area that handles very fine and highly sensitive microelectronic parts. The static sensitivity level for the microelectronic parts concerned is less than 100 V (HBM). We propose a new evaluation test method and guidance for new materials for use in highly susceptible microelectronics working areas. Unprotected devices with extremely thin oxide layers are very sensitive to electrostatic effects. Even some passive components such as capacitors, coils and resistors in surface mount packages are shown to be highly susceptible to electrostatic effects. Conventional static control methods are not always effective in protecting these modern parts, and thus it is time to re-evaluate static control methods and materials for the microelectronics market. In this paper, we consider the changes needed to ensure proper protection of extremely sensitive parts. We propose a new test methodology that better emulates the actual conditions encountered in microelectronics manufacturing.
Keywords
charge measurement; electric resistance measurement; electrostatic discharge; integrated circuit manufacture; integrated circuit measurement; integrated circuit packaging; integrated circuit reliability; integrated circuit testing; materials handling; surface charging; surface mount technology; 100 V; capacitors; charge decay measurement; coils; electrostatic effects; evaluation test method; manufacturing area; microelectronic components; microelectronic parts; microelectronics manufacturing conditions; microelectronics market; microelectronics working areas; passive components; protection; resistance measurement; resistors; sensitive microelectronic parts; static control materials; static control methods; static control worksurface; static sensitivity level; surface mount packages; test methodology; thin oxide layers; unprotected devices; work surface charge decay; work surface resistance; worksurfaces; Capacitors; Charge measurement; Coils; Current measurement; Electrical resistance measurement; Electrostatics; Materials testing; Microelectronics; Protection; Pulp manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-58537-018-5
Type
conf
DOI
10.1109/EOSESD.2000.890038
Filename
890038
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