Title :
Nano pattering by double expose hologram lithography and ZnO nanoscale photonic crystal
Author :
Kim, Tae Un ; Kim, Seon Hoon ; Kim, Sang-Taek ; Ki, Hyun Chul ; Yang, Myung Hak ; Kim, Hyo Jin ; Ko, Hang Ju ; Kim, Jin Hyeok ; Kim, Hwe Jong
Abstract :
We present spot and mesh patterns formed with same photo-resist by using ultra-violet laser holographic lithography. The ZnO nano crystal was deposited on patterned Si substrate by hydrothermal method.
Keywords :
II-VI semiconductors; holography; nanopatterning; photonic crystals; photoresists; ultraviolet lithography; zinc compounds; ZnO; double expose hologram lithography; hydrothermal method; mesh patterns; nanocrystal; nanopattering; nanoscale photonic crystal; photoresist; spot patterns; ultra-violet laser holographic lithography; Crystalline materials; Holography; Lattices; Lithography; Materials science and technology; Nanopatterning; Nanostructured materials; Photonic crystals; Resists; Zinc oxide;
Conference_Titel :
Opto-Electronics and Communications Conference, 2008 and the 2008 Australian Conference on Optical Fibre Technology. OECC/ACOFT 2008. Joint conference of the
Conference_Location :
Sydney
Print_ISBN :
978-0-85825-807-5
Electronic_ISBN :
978-0-85825-807-5
DOI :
10.1109/OECCACOFT.2008.4610334
