DocumentCode :
2729395
Title :
Non-Classical Hot-Electron Gate Current in the Deep Submicrometer N-MOS Flash Memory Cell
Author :
Zhang, Y. ; Ang, D.S. ; Kuan, H.P. ; Tan, K.T.
Author_Institution :
Microelectron. Centre, Nanyang Technol. Univ., Singapore
fYear :
2006
fDate :
3-7 July 2006
Firstpage :
75
Lastpage :
79
Abstract :
In this paper, experimental features of a non-classical hot-electron gate current Ig e obtained under Vb = 0, similar to those reported earlier under reverse Vb are presented. To the best of our knowledge, this is the first direct observation of this non-classical Ig e component in deep submicrometer N-channel MOSFET under conventional CHE biasing, i.e. when Vg ap Vd and Vb = 0. Based on the results, a phenomenological explanation as well as some further supporting experimental evidence is also presented here
Keywords :
MOSFET; flash memories; hot carriers; CHE biasing; deep submicrometer N-MOS flash memory cell; nonclassical hot-electron gate current; Channel hot electron injection; Charge carrier processes; Feedback; Flash memory cells; Heating; Impact ionization; MOSFET circuits; Nonvolatile memory; Substrate hot electron injection; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
1-4244-0205-0
Electronic_ISBN :
1-4244-0206-9
Type :
conf
DOI :
10.1109/IPFA.2006.251001
Filename :
4017026
Link To Document :
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