DocumentCode :
2729463
Title :
Diffractive lenses for high resolution laser based failure analysis
Author :
Zachariasse, Frank ; Goossens, Martijin
Author_Institution :
Philips Semicond., Nijmegen
fYear :
2006
fDate :
3-7 July 2006
Firstpage :
95
Lastpage :
96
Abstract :
In this paper, we demonstrate a practical alternative to the conventional SIL, which overcomes the above limitations. We show that it is possible to fabricate a lens directly on the back side of the silicon of the device under test. This lens works on principles of diffractive optics and is around 250 nm thick. The lens may be fabricated in about 1 hour, using a combination of FIB ion implantation lithography, followed by plasma etching. In combination with a commercial IR microscope objective, the lens shows diffraction-limited resolution as expected from its numerical aperture. It should be noted that the lens works only for monochromatic light, but this is not a drawback when applied to laser based techniques
Keywords :
diffraction gratings; failure analysis; focused ion beam technology; ion implantation; semiconductor device reliability; semiconductor lasers; sputter etching; FIB ion implantation lithography; IR microscope objective; diffraction limited resolution; diffractive lenses; failure analysis; high resolution laser; laser based techniques; monochromatic light; plasma etching; Failure analysis; Ion implantation; Lenses; Lithography; Optical diffraction; Particle beam optics; Plasma applications; Plasma devices; Silicon; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
1-4244-0205-0
Electronic_ISBN :
1-4244-0206-9
Type :
conf
DOI :
10.1109/IPFA.2006.251006
Filename :
4017031
Link To Document :
بازگشت