Title :
Emission Spectroscopy of Pulsed Powered Microplasma for Surface Treatment of PEN Film
Author :
Blajan, Marius ; Umeda, Akira ; Muramatsu, Shuichi ; Shimizu, Kazuo
Author_Institution :
Innovation & Joint Res. Center, Shizuoka Univ., Hamamatsu, Japan
Abstract :
Microplasma can be found in many applications. The technology is used also for surface treatment of polymers. The process of surface treatment by microplasma is environmental friendly and could be realized at low cost due to the relatively low discharge voltage (around 1 kV) even under atmospheric pressure and small size of power supply and reactor. This paper presents the surface treatment by microplasma of PEN (polyethylene naphthalate) film using Ar gas and mixtures of Ar with N2 and O2. Microplasma process was analyzed by emission spectroscopy method. An experimental Marx generator with MOSFET switches was used as a pulsed high voltage power supply. The emission spectra were measured by an ICCD camera, a spectrometer, and a photomultiplier tube. Surface wettability of PEN film was confirmed measuring contact angle before and after the microplasma surface treatment. It was observed that contact angle of PEN film was decreased especially with O2/Ar mixture. Analysis by X-ray photoelectron spectrometer (XPS) showed the decrease of C1s, which correspond to C-H bond. Emission spectrum of microplasma discharge in Ar/N2 mixture showed Ar peaks, OH peaks, N2 second positive band system peaks (N2 SPS) and N2 first positive band system peaks (N2 FPS) and a decrease in peaks intensities of ArI and OH for microplasma discharge in O2/Ar mixture. Lifetime emission signals for N2 SPS for the microplasma discharge in 0.25% N2 in Ar was around 1 μs. The calculation of microplasma rotational and electron temperatures show low rotational and high electron temperature.
Keywords :
X-ray photoelectron spectra; argon; contact angle; nitrogen; oxygen; plasma diagnostics; plasma materials processing; plasma temperature; polymer films; pulsed power technology; surface treatment; Ar; Ar-N2; Ar-O2; ICCD camera; MOSFET switches; Marx generator; PEN film surface treatment; PEN film surface wettability; X-ray photoelectron spectrometer; XPS analysis; a photomultiplier tube; argon plasma; argon-nitrogen plasma; argon-oxygen plasma; contact angle; first positive band system peaks; lifetime emission signals; microplasma discharge emission spectrum; microplasma electron temperature; microplasma rotational temperature; polyethylene naphthalate film; polymer surface treatment; pulsed high voltage power supply; pulsed powered microplasma emission spectroscopy; second positive band system peaks; Argon; Discharges; Electrodes; Films; Plasmas; Spectroscopy; Surface treatment;
Conference_Titel :
Industry Applications Society Annual Meeting (IAS), 2010 IEEE
Conference_Location :
Houston, TX
Print_ISBN :
978-1-4244-6393-0
DOI :
10.1109/IAS.2010.5614482