DocumentCode :
2739882
Title :
Electrical Properties of Cu Nanowires
Author :
Huang, Qiaojian ; Lilley, Carmen M. ; Bode, Matthias ; Divan, Ralu S.
Author_Institution :
Dept. of Mech. & Ind. Eng., Univ. of Illinois at Chicago, Chicago, IL
fYear :
2008
fDate :
18-21 Aug. 2008
Firstpage :
549
Lastpage :
552
Abstract :
Copper nanowires were patterned with e-beam lithography and fabricated with an e-beam evaporated Cu film. Electrical properties, including resistivity and temperature coefficient of resistance, were characterized for Cu nanowires with a width range of 90 nm to 330 nm. It was experimentally found that the surface and size have apparent influence on the electrical properties. The measured resistivity of the Cu nanowires was found to be size dependent, which was in good agreement with the theoretical models. In addition, smaller values of the temperature coefficient of resistance were experimentally found as the wire width decreases for the Cu nanowires. The size dependent nature of the temperature coefficient of resistance was attributed to the surface and size effects based on the further demonstrative analysis.
Keywords :
copper; electrical resistivity; electron beam lithography; nanolithography; nanopatterning; nanowires; size effect; Cu; copper nanowires; e-beam lithography; electrical resistivity; nanopatterning; resistance temperature coefficient; size 90 nm to 330 nm; size effects; Conductivity; Copper; Electric resistance; Electrical resistance measurement; Lithography; Nanowires; Size measurement; Surface resistance; Temperature distribution; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
Type :
conf
DOI :
10.1109/NANO.2008.163
Filename :
4617145
Link To Document :
بازگشت