• DocumentCode
    2740331
  • Title

    Pilot line processing of 18.6% efficient rear surface passivated large area solar cells

  • Author

    Wolf, Andreas ; Wotke, Edgar A. ; Walczak, Alexandra ; Mack, Sebastian ; Bitnar, Bernd ; Koch, Christian ; Preu, Ralf ; Biro, Daniel

  • Author_Institution
    Fraunhofer Inst. for Solar Energy Syst. ISE, Freiburg, Germany
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    We use the recently introduced Silicon Nitride Thermal Oxidation (SiNTO) process for the industrial fabrication of silicon solar cells that feature a thermal oxide passivated rear surface and local rear contacts. The SiNTO process represents an innovative approach for the fabrication of a passivated emitter and rear cell (PERC), since the front end part from the conventional process sequence is maintained. We apply mostly industrial production equipment using Czochralski silicon wafers that are partly processed in an industrial production line. Conventional screen printing is used for the formation of the front contacts. A stable conversion efficiency of 18.6% (independently confirmed) is achieved for a PERC device fabricated from conventional boron doped Cz-Silicon by means of the SiNTO process. The average efficiency of a batch of 24 SiNTO cells is 18.4%, measured after fabrication (not stabilized). A test module fabricated from 16 SiNTO solar cells features a fill factor of 76.2% and an open circuit voltage of 10.16 V, corresponding to an average of 635 mV per cell.
  • Keywords
    elemental semiconductors; oxidation; passivation; silicon; solar cells; Czochralski silicon wafers; PERC; Si:B; SiNTO process; passivated-emitter-and-rear cell fabrication; screen printing; silicon nitride thermal oxidation process; silicon solar cell industrial fabrication; thermal oxide passivation; Current measurement; Fabrication; Oxidation; Passivation; Photovoltaic cells; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5614616
  • Filename
    5614616