DocumentCode :
2740357
Title :
Magnetic Annular Nanostructure Fabrication Using Ion Beam Proximity Lithography
Author :
Ruiz, Ariel ; Parekh, Vishal ; Rantschler, James ; Ruchhoeft, Paul ; Khizroev, Sakhrat ; Litvinov, Dmitri
Author_Institution :
Center for Nanomagnetic Syst., Univ. of Houston, Houston, TX
fYear :
2008
fDate :
18-21 Aug. 2008
Firstpage :
631
Lastpage :
632
Abstract :
We describe the fabrication of large-area magnetic ring structures using ion beam proximity lithography (IBPL) to pattern an array of circular openings and then use a conforming oxide coating to define the ring structure through the sidewall coating. Arrays of Permalloy rings with sub 500 nm outer diameter and 150 nm inner diameter on a 650 nm pitch over a 5.5 mm times 6 mm area were fabricated to study transitions between the micromagnetic configurations within these structures. The results suggest that the field required for onion-to-vortex transition and field required for vortex-to-onion transition to be 0Oe and 400Oe, respectively.
Keywords :
Permalloy; ion beam lithography; magnetic storage; nanolithography; nanostructured materials; proximity effect (lithography); random-access storage; IBPL; MRAM; Permalloy rings; ion beam proximity lithography; magnetic annular nanostructure fabrication; micromagnetic configurations; onion-vortex transition; size 150 nm; size 500 nm; size 650 nm; Coatings; Fabrication; Ion beams; Lithography; Magnetic flux; Magnetostatics; Plasma applications; Radio frequency; Sputtering; Student members;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
Type :
conf
DOI :
10.1109/NANO.2008.189
Filename :
4617171
Link To Document :
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