Solution Processed Large Area Surface Textures Based on Dip Coating

We report here the dip coating processes for the formation of large area self-assembled monolayer of micro- sized silica spheres, on glass and on silicon substrates. The self- assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3times10 mm² and 1.5times11 mm² on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.