Title :
Field emission characteristics of CVD diamond coated copper field emitters
Author :
Xie Kuojun ; Zeng Baoqing ; Yang Zhonghai
Author_Institution :
Inst. of High Energy Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
The polycrystalline diamond films were synthesized on a copper substrate by microwave plasma chemical vapor deposition technique. The field emission characteristics and the electrical characteristics of contacts between metal and diamond film have investigated.
Keywords :
copper; diamond; electron field emission; ohmic contacts; plasma CVD coatings; semiconductor thin films; semiconductor-metal boundaries; vacuum microelectronics; C-Cu; CVD diamond coated Cu field emitters; Cu; Cu substrate; FEA; NEA; chemical vapor deposition technique; electrical characteristics; field emission characteristics; metal/diamond film interface; microwave plasma CVD technique; negative electron affinity; polycrystalline diamond films; Chemical vapor deposition; Contact resistance; Copper; Current measurement; Electrodes; Electron emission; Ohmic contacts; Scanning electron microscopy; Substrates; Thermal expansion;
Conference_Titel :
Infrared and Millimeter Waves, 2000. Conference Digest. 2000 25th International Conference on
Conference_Location :
Beijing, China
Print_ISBN :
0-7803-6513-5
DOI :
10.1109/ICIMW.2000.893056
