Title :
Direct Formation Of Silicon Dioxide Mask Using A Novel Radiation-Sensitive Spin-on-Glass
Author :
Sakata, M. ; Ito, T. ; Endo, A. ; Jinbo, H. ; Ashida, I.
Author_Institution :
Oki Electric Industry Co. Ltd.
Conference_Titel :
VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location :
Kyoto, Japan
DOI :
10.1109/VLSIT.1993.760291
