DocumentCode :
275330
Title :
Single crystal silicon rotational micromotors
Author :
Suzuki, Kenichiro ; Tanigawa, Hiroshi
Author_Institution :
NEC Corp., Kanagawa, Japan
fYear :
1991
fDate :
30 Jan-2 Feb 1991
Firstpage :
15
Lastpage :
20
Abstract :
Three types of rotational micromotors, stepping, harmonic, and gyro-like side-drives, are presented. The rotors, poles, and stators are made of a thick single crystal silicon layer by using boron-diffused silicon etch stop to define the thickness and using anisotropic dry etching to form narrow and deep separation gaps. The rotor stoppers are fabricated by polysilicon trench filling and sacrificial layer etching processes. The silicon chips are electrostatically bonded onto glass chips, followed by unmasked wafer dissolution, freeing the rotors so that they can move. The novel process successfully provided micromotors with a 50 μm diameter rotor
Keywords :
boron; elemental semiconductors; etching; micromechanical devices; silicon; small electric machines; stepping motors; 50 micron; Si:B; anisotropic dry etching; etch stop; gyro-like side-drives; harmonic motors; polysilicon trench filling; rotational micromotors; rotors; sacrificial layer etching processes; separation gaps; stators; stepping motors; unmasked wafer dissolution; Bonding; Dry etching; Fabrication; Filling; Glass; Laboratories; Microactuators; Micromotors; National electric code; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location :
Nara
Print_ISBN :
0-87942-641-1
Type :
conf
DOI :
10.1109/MEMSYS.1991.114762
Filename :
114762
Link To Document :
بازگشت