DocumentCode :
2770806
Title :
Low-voltage limitations of memory-rich nano-scale CMOS LSIs
Author :
Itoh, Kiyoo ; Horiguchi, Masashi ; Yamaoka, Masanao
Author_Institution :
Hitachi, Ltd., Tokyo
fYear :
2007
fDate :
11-13 Sept. 2007
Firstpage :
68
Lastpage :
75
Abstract :
The low-voltage limitations of memory-rich nano- scale CMOS LSIs using bulk CMOS and fully-depleted (FD) SOI devices are described, focusing on CMOS inverter and flip- flop circuits such as six-transistor (6-T) cells in SRAMs and sense amplifiers in DRAMs. The limitations strongly depend on the ever-larger VT variation, especially in SRAM cells and logic gates, and are improved by using the FD-SOI as well as by using repair techniques. Consequently, two possible LSIs are predicted to coexist in the deep-sub-100-nm generation: high- VDD bulk CMOS LSIs for low-cost low-standby-current applications and low-FDD FD-SOI LSIs for low-power applications.
Keywords :
CMOS digital integrated circuits; DRAM chips; SRAM chips; flip-flops; large scale integration; logic design; logic gates; low-power electronics; silicon-on-insulator; CMOS inverter; DRAM; SRAM; flip-flop circuits; fully-depleted SOI devices; nanoscale CMOS LSI; sense amplifiers; six-transistor cells; size 100 nm; CMOS logic circuits; CMOS memory circuits; CMOS technology; Flip-flops; Inverters; Laboratories; Logic devices; Nanoscale devices; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Circuits Conference, 2007. ESSCIRC 2007. 33rd European
Conference_Location :
Munich
ISSN :
1930-8833
Print_ISBN :
978-1-4244-1125-2
Type :
conf
DOI :
10.1109/ESSCIRC.2007.4430250
Filename :
4430250
Link To Document :
بازگشت