Title :
Phase-shift control in two-beam laser interference lithography
Author :
Xu, Jia ; Zhang, Wei ; Liu, Lanjiao ; Wang, Zuobin ; Jin Zhang ; Song, Zhengxun ; Weng, Zhankun ; Hu, Zhen ; Yue, Yong ; Li, Dayou
Author_Institution :
CNM & IJRCNB Centers, Changchun Univ. of Sci. & Technol., Changchun, China
Abstract :
This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.
Keywords :
actuators; gas lasers; helium; laser materials processing; light interference; microfabrication; mirrors; nanofabrication; neon; optical variables control; phase control; photolithography; He-Ne; PZT actuator; fringe pattern correlation; fringe positions; mirror; multi-exposure patterning; phase shift control; subpixel accuracy; two beam laser interference lithography; Actuators; Correlation; Interference; Laser beams; Lithography; Mirrors; Optical beams; Laser interference lithography; phase shift; phase shift control;
Conference_Titel :
Mechatronics and Automation (ICMA), 2011 International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-8113-2
DOI :
10.1109/ICMA.2011.5985725
