• DocumentCode
    278204
  • Title

    Carrier confinement and overshoot velocities in GaAs and InP based HEMTs

  • Author

    Kohn, Erhard ; Dickmann, Jü

  • Author_Institution
    Dept. of Electron Devices & Circuits, Ulm Univ., Germany
  • fYear
    1991
  • fDate
    33324
  • Firstpage
    42401
  • Lastpage
    42405
  • Abstract
    High speed HEMT devices operate in the electron overshoot velocity regime. Extrinsic electron transit velocities above 2×107 cm/s as defined by the fT*Lg- product have been observed. To obtain optimum RF conditions under these circumstances, the aspect ratio Lg/t plays an important role as for example in determining the fmax/fT-ratio. The aspect ratio is a geometrical figure of merit, which fails however to address current injection into the buffer layer, which is thought to be substantially reduced by using a deep QW-channel. The authors address the question whether in QW-channel FET devices the aspect ratio alone is still the dominating figure of merit or whether this has to be modified, taking also into account various degrees of carrier confinement. Here, the confinement of hot carriers in the drift region is considered through changes in the small signal parameters especially the output conductance Gds
  • Keywords
    III-V semiconductors; gallium arsenide; high electron mobility transistors; hot carriers; indium compounds; semiconductor device models; solid-state microwave devices; GaAs; HEMTs; InP; QW-channel FET devices; buffer layer; carrier confinement; current injection; deep QW-channel; drift region; electron overshoot velocity regime; extrinsic electron transit velocities; first-order model; high speed devices; hot carriers; microwave transistors; output conductance; overshoot velocities; small signal parameters;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Millimetre Wave Transistors and Circuits, IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • Filename
    181364