DocumentCode
278204
Title
Carrier confinement and overshoot velocities in GaAs and InP based HEMTs
Author
Kohn, Erhard ; Dickmann, Jü
Author_Institution
Dept. of Electron Devices & Circuits, Ulm Univ., Germany
fYear
1991
fDate
33324
Firstpage
42401
Lastpage
42405
Abstract
High speed HEMT devices operate in the electron overshoot velocity regime. Extrinsic electron transit velocities above 2×107 cm/s as defined by the fT*Lg- product have been observed. To obtain optimum RF conditions under these circumstances, the aspect ratio Lg/t plays an important role as for example in determining the fmax/fT-ratio. The aspect ratio is a geometrical figure of merit, which fails however to address current injection into the buffer layer, which is thought to be substantially reduced by using a deep QW-channel. The authors address the question whether in QW-channel FET devices the aspect ratio alone is still the dominating figure of merit or whether this has to be modified, taking also into account various degrees of carrier confinement. Here, the confinement of hot carriers in the drift region is considered through changes in the small signal parameters especially the output conductance Gds
Keywords
III-V semiconductors; gallium arsenide; high electron mobility transistors; hot carriers; indium compounds; semiconductor device models; solid-state microwave devices; GaAs; HEMTs; InP; QW-channel FET devices; buffer layer; carrier confinement; current injection; deep QW-channel; drift region; electron overshoot velocity regime; extrinsic electron transit velocities; first-order model; high speed devices; hot carriers; microwave transistors; output conductance; overshoot velocities; small signal parameters;
fLanguage
English
Publisher
iet
Conference_Titel
Millimetre Wave Transistors and Circuits, IEE Colloquium on
Conference_Location
London
Type
conf
Filename
181364
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