Title :
Is entanglement dispensable in quantum lithography?
Author :
Angelo, Milena D. ; Scarcelli, G. ; Shih, Yanhua
Author_Institution :
European Laboratory for Nonlinear Spectroscopy, Via N. Carrara 1, S.to Fiorentino (FI), Italy
Abstract :
Can classical light simulate the effect of quantum lithography? The analysis of the two-photon image generated both by entangled two-photon and by chaotic radiation indicates that only entanglement can double the resolution of an image.
Keywords :
Chaos; Image analysis; Interference; Lenses; Light sources; Lithography; Optical imaging; Physics; Quantum entanglement; Spatial resolution;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2007. QELS '07
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/QELS.2007.4431244
