DocumentCode
2787397
Title
1.57 µm passively mode-locked wafer-fused semiconductor disk laser
Author
Saarinen, E.J. ; Lyytikainen, J. ; Rautiainen, J. ; Korpijarvi, V.-M. ; Sirbu, A. ; Mereuta, A. ; Caliman, A. ; Kapon, E. ; Okhotnikov, O.G.
Author_Institution
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
Semiconductor disk lasers (SDLs) operating around 1.55 mum have been the subject of increasing interest. The performance of monolithically grown SDLs in this wavelength range suffers, however, from the poor quality of the InP-based distributed Bragg reflector (DBR). Recently, wafer fusion technique was applied to a long- wavelength SDL to avoid this obstacle. An active region grown on InP substrate was wafer fused to a GaAs/AlGaAs-based DBR resulting in a device operating at 1.57 mum with 2.6 W average output power and a near diffraction limited beam. Here we present the first mode-locked SDL using a wafer-fused gain reflector.
Keywords
III-V semiconductors; aluminium compounds; distributed Bragg reflectors; gallium arsenide; indium compounds; laser beams; laser mode locking; semiconductor lasers; GaAs-AlGaAs; InP; diffraction limited beam; distributed Bragg reflector; passively mode-locked laser; power 2.6 W; wafer-fused gain reflector; wafer-fused semiconductor disk laser; Gallium arsenide; Indium phosphide; Laser mode locking; Mirrors; Molecular beam epitaxial growth; Optical pulses; Optical pumping; Semiconductor lasers; Substrates; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5192151
Filename
5192151
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