DocumentCode
27874
Title
Analysis of the Switching Variability in
-Based RRAM Devices
Author
Gonzalez, M.B. ; Rafi, J.M. ; Beldarrain, O. ; Zabala, M. ; Campabadal, F.
Author_Institution
Inst. de Microelectron. de Barcelona (CNMCSIC), Campus Univ. Autonoma de Barcelona (UAB), Bellaterra, Spain
Volume
14
Issue
2
fYear
2014
fDate
Jun-14
Firstpage
769
Lastpage
771
Abstract
In this letter, we focus on the cycle-to-cycle variability of the low resistive state in Ni/HfO2-based resistive switching structures. The results show that several discrete current levels can individually last hundreds of cycles. They are a result of the random nature of the reversible conductive path formation through percolation processes, which could be attributed to a different shape, size, or number of conductive filaments. After successive cycles, the same or new filaments will nucleate in the weaker zones of the dielectric. In addition, the switching voltages related to the creation and dissolution of localized conductive paths are found to be statistically associated.
Keywords
hafnium compounds; nickel; percolation; random-access storage; semiconductor device testing; switching circuits; Ni-HfO2; RRAM devices; conductive filaments; cycle-to-cycle variability; discrete current levels; localized conductive paths; percolation processes; resistive random access memories; resistive state; resistive switching structures; reversible conductive path formation; switching variability; switching voltages; Electrodes; Hafnium compounds; Nickel; Random access memory; Shape; Switches; $hbox{HfO}_{2}$; Conductive filament (CF); Ni; resistive random access memory (RRAM); unipolar switching; variability;
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2014.2311231
Filename
6763037
Link To Document