• DocumentCode
    27874
  • Title

    Analysis of the Switching Variability in \\hbox {Ni/HfO}_{2} -Based RRAM Devices

  • Author

    Gonzalez, M.B. ; Rafi, J.M. ; Beldarrain, O. ; Zabala, M. ; Campabadal, F.

  • Author_Institution
    Inst. de Microelectron. de Barcelona (CNMCSIC), Campus Univ. Autonoma de Barcelona (UAB), Bellaterra, Spain
  • Volume
    14
  • Issue
    2
  • fYear
    2014
  • fDate
    Jun-14
  • Firstpage
    769
  • Lastpage
    771
  • Abstract
    In this letter, we focus on the cycle-to-cycle variability of the low resistive state in Ni/HfO2-based resistive switching structures. The results show that several discrete current levels can individually last hundreds of cycles. They are a result of the random nature of the reversible conductive path formation through percolation processes, which could be attributed to a different shape, size, or number of conductive filaments. After successive cycles, the same or new filaments will nucleate in the weaker zones of the dielectric. In addition, the switching voltages related to the creation and dissolution of localized conductive paths are found to be statistically associated.
  • Keywords
    hafnium compounds; nickel; percolation; random-access storage; semiconductor device testing; switching circuits; Ni-HfO2; RRAM devices; conductive filaments; cycle-to-cycle variability; discrete current levels; localized conductive paths; percolation processes; resistive random access memories; resistive state; resistive switching structures; reversible conductive path formation; switching variability; switching voltages; Electrodes; Hafnium compounds; Nickel; Random access memory; Shape; Switches; $hbox{HfO}_{2}$; Conductive filament (CF); Ni; resistive random access memory (RRAM); unipolar switching; variability;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2014.2311231
  • Filename
    6763037