Title :
Design-manufacturing interface for 0.13 micron and below
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
Summary form only given. This tutorial presents the requirements for the design-manufacturing interface in the upcoming generations of ULSI technologies. We start by presenting an overview of trends in the semiconductor industry: accelerated roadmap which leads to further miniaturization, the increasing role of manufacturing fluctuations, shrinking time to market, product complexity (including SOC) and the overall disaggregation of semiconductor industry (emergence of fabless companies and increasing role of foundries in manufacturing). Then we discuss the current, isolated approach to process development, product design and volume manufacturing. We conclude the tutorial by discussing the technical and organizational challenges that must be overcome to successfully implement this new design-manufacturing interface.
Keywords :
ULSI; design for manufacture; electronics industry; ULSI; design-manufacturing interface; disaggregation; miniaturization; process development; product design; semiconductor industry; volume manufacturing; Acceleration; Electronics industry; Fluctuations; Lead compounds; Manufacturing processes; Product design; Semiconductor device manufacture; Time to market; Ultra large scale integration;
Conference_Titel :
Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA, USA
Print_ISBN :
0-7803-6445-7
DOI :
10.1109/ICCAD.2000.896534