DocumentCode :
2792221
Title :
Design-manufacturing interface for 0.13 micron and below
Author :
Strojwas, A.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
2000
fDate :
5-9 Nov. 2000
Firstpage :
575
Abstract :
Summary form only given. This tutorial presents the requirements for the design-manufacturing interface in the upcoming generations of ULSI technologies. We start by presenting an overview of trends in the semiconductor industry: accelerated roadmap which leads to further miniaturization, the increasing role of manufacturing fluctuations, shrinking time to market, product complexity (including SOC) and the overall disaggregation of semiconductor industry (emergence of fabless companies and increasing role of foundries in manufacturing). Then we discuss the current, isolated approach to process development, product design and volume manufacturing. We conclude the tutorial by discussing the technical and organizational challenges that must be overcome to successfully implement this new design-manufacturing interface.
Keywords :
ULSI; design for manufacture; electronics industry; ULSI; design-manufacturing interface; disaggregation; miniaturization; process development; product design; semiconductor industry; volume manufacturing; Acceleration; Electronics industry; Fluctuations; Lead compounds; Manufacturing processes; Product design; Semiconductor device manufacture; Time to market; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer Aided Design, 2000. ICCAD-2000. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA, USA
ISSN :
1092-3152
Print_ISBN :
0-7803-6445-7
Type :
conf
DOI :
10.1109/ICCAD.2000.896534
Filename :
896534
Link To Document :
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