Title :
COOLMOSTM-a new milestone in high voltage power MOS
Author :
Lorenz, L. ; Deboy, G. ; Knapp, A. ; März, M.
Author_Institution :
Semicond. Div., Siemens AG, Munich, Germany
Abstract :
Recently, a new technology for high voltage power MOSFETs has been introduced: the CoolMOSTM. Based on the new device concept of charge compensation, the RDS(on) area product for e.g. 600 V transistors has been reduced by a factor of 5. The devices show no bipolar current contribution like the well known tail current observed during the turn-off phase of IGBTs. CoolMOSTM virtually combines the low switching losses of a MOSFET with the on-state losses of an IGBT. Furthermore, the dependence of RDS(on) on the breakdown voltage has been redefined. The more than square-law dependence in the case of standard MOSFET has been broken and a linear voltage dependence achieved. This opens the way to new fields of application even without avalanche operation. System miniaturization, higher switching frequencies, lower circuit parasitics, higher efficiency, and reduced system costs are pointing the way towards future developments. Not only has the new technology achieved breakthrough at reduced RDS(on) values, but new benchmarks have also been set for the device capacitances. Due to chip shrinkage and a novel internal structure, the technology shows both a very small input capacitance and a strongly nonlinear output capacitance. The drastically lower gate charge facilitates and reduces the cost of controllability, and the smaller feedback capacitance reduces the dynamic losses. With this new technology, the minimum RDS(on) values in all packages are being redefined in the important 600-1000 V categories
Keywords :
capacitance; electric resistance; losses; power MOSFET; power semiconductor switches; semiconductor device breakdown; 600 to 1000 V; CoolMOS; CoolMOS high voltage power MOSFET; avalanche operation; bipolar current contribution; breakdown voltage; charge compensation; chip shrinkage; circuit parasitics; controllability; device capacitances; drain-source on-resistance area product; dynamic losses; efficiency; feedback capacitance; gate charge; high voltage power MOSFETs; input capacitance; internal structure; linear voltage dependence; nonlinear output capacitance; on-state losses; switching frequencies; switching losses; system costs; system miniaturization; tail current; Circuits; Controllability; Costs; Insulated gate bipolar transistors; MOSFETs; Parasitic capacitance; Switching frequency; Switching loss; Tail; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1999. ISPSD '99. Proceedings., The 11th International Symposium on
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-5290-4
DOI :
10.1109/ISPSD.1999.764028