DocumentCode :
2798953
Title :
Full wafer processing and testing the future of large scale laser fabrication
Author :
Vettiger, P. ; Benedict, M.E. ; Bona, G.L. ; Buchmann, P. ; Cahoon, N. ; Daetwyler, K. ; Dietrich, H.P. ; Moser, A. ; Seitz, H.K. ; Voegeli, O. ; Webb, D.J. ; Wolf, P.
Author_Institution :
IBM Research Laboratory Zurich
fYear :
1990
fDate :
9-14 Sept. 1990
Firstpage :
144
Lastpage :
145
Keywords :
Chemical lasers; Etching; Large-scale systems; Laser feedback; Laser modes; Mirrors; Optical device fabrication; Semiconductor device testing; Semiconductor diodes; Semiconductor lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Laser Conference, 1990. Conference Digest. 12th IEEE International
Conference_Location :
Davos, Switzerland
Type :
conf
DOI :
10.1109/ISLC.1990.764464
Filename :
764464
Link To Document :
بازگشت