Title :
Active NEM filters for communications applications based on vibrating body transistors
Author :
Lovera, A. ; Bartsch, S. ; Grogg, D. ; Ayöz, S. ; Kaunisto, R. ; Ionescu, A.M.
Author_Institution :
Nanoelectronic Devices Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
Abstract :
In this work we propose and demonstrate the first active Nano-Electro-Mechanical (NEM) filters based on scaled vibrating body field effect transistor (VB-FET) with mechanically coupled flexural-mode beam resonators working at a fundamental resonant frequency of 115 MHz. The VB-FET filters are fabricated on a 200 nm thin SOI substrate using E-Beam lithography and sacrificial layer etching. Numerical simulations prove the validity of the design and allow a fine control of the center frequency and bandwidth via applied DC voltages. The measured DC characteristics show a working FET with threshold voltage at -3V and short channel effects. Despite the low signal-to-background ratio, direct S-parameter measurements demonstrate the functionality and the tuneable gain of VB-FET based NEM-filters.
Keywords :
VHF filters; active filters; electron beam lithography; etching; field effect transistors; nanoelectromechanical devices; numerical analysis; silicon-on-insulator; SOI substrate; VB-FET; active NEM filters; active nano-electro-mechanical filters; communications applications; e-beam lithography; frequency 115 MHz; numerical simulations; resonant frequency; sacrificial layer etching; vibrating body field effect transistor; voltage -3 V; Active filters; Bandwidth; FETs; Logic gates; Resonant frequency; Resonator filters; Vibrations;
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
Print_ISBN :
978-1-4244-6658-0
DOI :
10.1109/ESSDERC.2010.5618170