DocumentCode
2801376
Title
Origins of universal mobility violation in SOI MOSFETs
Author
Rodriguez, N. ; Cristoloveanu, S. ; Gamiz, F.
Author_Institution
Dept. de Electron., Univ. of Granada, Granada, Spain
fYear
2010
fDate
14-16 Sept. 2010
Firstpage
420
Lastpage
423
Abstract
The relation between the effective mobility and the transversal field is systematically investigated for SOI-MOSFETs operated in single-gate and double-gate modes. We point out several practical situations where the Universal Mobility (UM) concept is not applicable. In particular, different carrier distributions can lead to the same value of effective field and to distinct mobility values, breaking the foundations of the UM curve. The presence of two interfaces and channels with different quality or the carrier redistribution within the transistor body cannot be accounted in the UM. In particular cases, very unusual mobility-field curves are obtained.
Keywords
MOSFET; silicon-on-insulator; SOI MOSFET; distinct mobility values; double-gate modes; mobility-field curves; single-gate modes; universal mobility violation; Electric fields; Electron mobility; Equations; Logic gates; MOSFETs; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location
Sevilla
ISSN
1930-8876
Print_ISBN
978-1-4244-6658-0
Type
conf
DOI
10.1109/ESSDERC.2010.5618192
Filename
5618192
Link To Document