Title :
Resistive switching-like behaviour of the dielectric breakdown in ultra-thin Hf based gate stacks in mosfets
Author :
Crespo-Yepes, A. ; Martin-Martinez, J. ; Rodriguez, R. ; Nafria, M. ; Aymerich, X. ; Rothschild, A.
Author_Institution :
Dept. d´´Eng. Electron., Univ. Autonoma de Barcelona (UAB), Bellaterra, Spain
Abstract :
The gate dielectric breakdown (BD) reversibility in MOSFETs with ultra-thin hafnium based high-k dielectric is studied. The phenomenology is analyzed in detail and the similarities with the resistive switching phenomenon emphasized. The results suggest that the conductive path in the dielectric after BD can be `opened´ and `closed´ many times and that the BD recovery partially restores not only the current through the gate, but also the MOSFET channel related electrical characteristics.
Keywords :
MOSFET; hafnium; high-k dielectric thin films; semiconductor device breakdown; switching circuits; Hf; MOSFET; conductive path; dielectric breakdown; gate dielectric breakdown reversibility; high-k dielectric; resistive switching-like behaviour; ultra-thin HF based gate stacks; Conductivity; Current measurement; Dielectrics; Logic gates; MOSFETs; Switches;
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
Print_ISBN :
978-1-4244-6658-0
DOI :
10.1109/ESSDERC.2010.5618448
