• DocumentCode
    2807995
  • Title

    Effect of angular velocity of spin dryer on wafer drying process

  • Author

    Lin, Meng-Ju

  • Author_Institution
    Feng Chia Univ., Taichung
  • fYear
    2007
  • fDate
    1-3 Oct. 2007
  • Firstpage
    169
  • Lastpage
    171
  • Abstract
    Effect of angular velocity on spin drying is investigated. Mass and position of water droplet are also discussed. They are also affecting the drying results. Some equations are derived to determine drying result. It is determined by angular velocity, droplet mass, and droplet position. The results show that more angular velocity would be more easily removing the water droplet. And the larger water droplet would be more easily remove. Comparing the spin radius of spin dryer, the difference of water droplet position on wafer is small. Therefore, the position of droplet on wafer has no significant effect on drying and could be ignored. The relationship between angular velocity and size of water droplet is also discussed. An equation is derived. From the results, it is easier to determine result of the drying process. And, by tuning some parameters like angular velocity, it would have better drying results during the spin drying process.
  • Keywords
    angular velocity; drops; drying; integrated circuit manufacture; production equipment; angular velocity; droplet mass; droplet position; spin dryer; wafer drying process; water droplet; Angular velocity; Cleaning; Computer aided engineering; Equations; Micromechanical devices; Semiconductor device modeling; Semiconductor devices; Semiconductor materials; Shape; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology, 2007. IMPACT 2007. International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-1636-3
  • Electronic_ISBN
    978-1-4244-1637-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2007.4433593
  • Filename
    4433593