DocumentCode :
2816424
Title :
Investigations of a-plane and c-plane GaN-based synchronous surface acoustic wave resonators
Author :
Loschonsky, Marc ; Eisele, David ; Dadgar, Armin ; Krost, Alois ; Ballandras, Sylvain ; Reindl, Leonhard
Author_Institution :
IMTEK - Dept. of Microsyst. Eng., Albert-Ludwigs-Univ. Freiburg, Freiburg
fYear :
2008
fDate :
19-21 May 2008
Firstpage :
320
Lastpage :
325
Abstract :
Metal-Organic-Vapor-Phase-Epitaxy (MOVPE) is a well established process for compound semiconductor layer growth especially of III-V semiconductors as InP, GaAs, and the nitrides GaN or AlN. In the case of the nitrides one can obtain highly oriented a-plane piezoelectric material, well suited for shear-microwave applications, by tilting the c-axis of the piezoelectric unit cell by 90deg to result in a-plane oriented crystallites. The high Q and insertion loss of filters is currently limited by the actual minimum of achievable layer thickness, where the surface is still smooth and pits-free. A lower temperature coefficient of the frequency as for longitudinal polarized waves is expected. We present results of fabrication and measurement of MOVPE grown a-plane and c-plane gallium nitride based surface acoustic wave resonators on r-plane sapphire substrates. Both types of materials were used to build up resonators and their S-parameters, temperature coefficients up to 200degC and wave velocities were measured. Also the wave characteristics under periodic metal grating were computed for the considered substrate configuration, allowing for the simulation of the experimental device using a mixed matrix approach. Both theoretical and experimental admittance of the SAW test devices are subsequently compared.
Keywords :
III-V semiconductors; MOCVD; S-parameters; acoustic filters; acoustic microwave devices; diffraction gratings; gallium arsenide; piezoelectric materials; resonator filters; semiconductor growth; semiconductor thin films; surface acoustic wave resonators; synchronisation; vapour phase epitaxial growth; Al2O3; GaN; III-V semiconductors; MOVPE; S-parameters; SAW test device admittance; a-plane piezoelectric material; acoustic wave velocities; c-plane operation; compound semiconductor layer growth; filters operation; gallium nitride; high Q value; insertion loss; metal-organic-vapor-phase-epitaxy; mixed matrix approach; periodic metal grating; polarized waves; r-plane sapphire substrates; shear-microwave applications; substrate configuration; surface acoustic wave resonators; temperature coefficient; Acoustic measurements; Acoustic waves; Epitaxial growth; Epitaxial layers; Gallium nitride; III-V semiconductor materials; Indium phosphide; Substrates; Surface acoustic waves; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium, 2008 IEEE International
Conference_Location :
Honolulu, HI
ISSN :
1075-6787
Print_ISBN :
978-1-4244-1794-0
Electronic_ISBN :
1075-6787
Type :
conf
DOI :
10.1109/FREQ.2008.4623012
Filename :
4623012
Link To Document :
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