DocumentCode :
2818184
Title :
Modeling of energy capability of power devices with copper layer integration
Author :
Elattari, B. ; Driessens, E. ; Webers, T. ; Van den Bosch, G. ; Moens, P. ; Groeseneken, G.
Author_Institution :
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium. 32-16-281378; e-mail: elattari@imec.be
fYear :
2005
fDate :
01-03 Sept. 2005
Firstpage :
207
Lastpage :
210
Abstract :
High power devices can generate large amount of heat dissipation that limits severely their power handling capability. In this paper, we propose intensive investigations of the electro-thermal characteristics of lateral nDMOS transistors processed in a 0.7 μm CMOS based smart power technology. In particular, it is demonstrated, both experimentally and theoretically, that the thermal management improves substantially when a layer of an electroplated copper is deposited on top of the power device. The latter serves as a heat sink to help dissipate the heat generated during operating conditions. More importantly, we have derived a simple but yet potential theoretical model which predictions are in complete agreement with experimental and simulation results.
Keywords :
Power devices; heat dissipation; heat sink.; CMOS process; CMOS technology; Copper; Electrodes; Energy management; Heat sinks; MOSFETs; Predictive models; Temperature; Thermal management; Power devices; heat dissipation; heat sink.;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN :
4-9902762-0-5
Type :
conf
DOI :
10.1109/SISPAD.2005.201509
Filename :
1562061
Link To Document :
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