DocumentCode :
2844898
Title :
Inhomogeneous spatial distribution of shallow impurities in a photoexcited semiconductors
Author :
Fuji, K. ; Hosokawa, M. ; Ohyama, T.
Author_Institution :
Dept. of Phys., Osaka Univ., Japan
fYear :
1998
fDate :
1998
Firstpage :
702
Lastpage :
705
Abstract :
Stark broadening of impurity Zeeman absorption peak is studied from a far-infrared absorption measurement and Monte Carlo calculation. Monte Carlo calculation predicts the difference between the dependence of the Stark broadening on the delay time and on the excitation intensity. The difference is caused from the spatial distribution of the ionized impurity. In the delay time variation of the Stark broadening, spatial correlation between ionized donors and acceptors is induced. The experimental results, however, does not show the difference. The inconsistency would be explained from the hopping of bound carriers
Keywords :
Monte Carlo methods; Stark effect; Zeeman effect; impurity absorption spectra; impurity distribution; infrared spectra; photoexcitation; semiconductors; spectral line broadening; Monte Carlo simulation; Stark broadening; Zeeman absorption; carrier hopping; compensated semiconductor; donor-acceptor pair recombination; far infrared absorption; inhomogeneous spatial distribution; ionized impurity; photoexcitation; shallow impurity; spatial correlation; Absorption; Charge carrier processes; Delay effects; Digital audio players; Monte Carlo methods; Nanofabrication; Physics; Radiative recombination; Semiconductor impurities; Spontaneous emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology Proceedings, 1998. ICMMT '98. 1998 International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4308-5
Type :
conf
DOI :
10.1109/ICMMT.1998.768386
Filename :
768386
Link To Document :
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