Application of aluminium metallisation in ldmos RF power applications

Author

van der Wel, P.J. ; van den Heuvel, R.A. ; Peuscher, H.J.F. ; Li, Y. ; Gommans, J.G. ; van Rijs, F. ; Bron, P. ; Theeuwen, S.J.C.H.

fYear

2005

fDate

Oct. 30, 2005

Firstpage

151

Lastpage

154

Keywords

Aluminum; Base stations; Degradation; Electromigration; Gold; Metallization; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

ROCS Workshop, 2005. [Reliability of Compound Semiconductors]

Print_ISBN

0-7908-0106-X

Type

DOI

10.1109/ROCS.2005.201561

Filename

1563945

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