• DocumentCode
    2852344
  • Title

    Gm enhancement for bulk-driven sub-threshold differential pair in nanometer CMOS process

  • Author

    Ferreira, Luis H. C. ; Sonkusale, Sameer R.

  • Author_Institution
    Syst. Eng. & Inf. Technol. Inst., Fed. Univ. of Itajuba, Itajuba, Brazil
  • fYear
    2012
  • fDate
    9-10 Oct. 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this paper a simple and efficient way to enhance the transconductance Gm for bulk-driven sub-threshold differential pair in nanometer CMOS process is presented. This approach is based on a type of positive feedback source degeneration, which does not depend on geometry parameters or biasing voltages, and leads to improved values for the DC gain and the unity gain frequency, without increasing power consumption or changing other features. Despite of possible differential pair output resistance variation, the DC gain and the unity gain frequency of weak inversion differential pair can be increased by (n + 1)/(n - 1) times (e.g., 13.72 times in an 130-nm IBM CMOS process), a factor that improves with scaling while many other device characteristics degrade.
  • Keywords
    CMOS integrated circuits; circuit feedback; differential amplifiers; nanoelectronics; DC gain; Gm enhancement; biasing voltages; bulk-driven differential pair; geometry parameters; nanometer CMOS process; positive feedback source degeneration; size 130 nm; unity gain frequency; weak inversion differential pair; CMOS process; Gain; Power demand; Threshold voltage; Transconductance; Transistors; Gm enhancement; bulk-driven differential pair; low-power applications; low-voltage; nanometer CMOS process;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Subthreshold Microelectronics Conference (SubVT), 2012 IEEE
  • Conference_Location
    Waltham, MA
  • Print_ISBN
    978-1-4673-1586-9
  • Type

    conf

  • DOI
    10.1109/SubVT.2012.6404320
  • Filename
    6404320