DocumentCode
2852945
Title
Liquid helium temperature analog operation of asymmetric self-cascode FD SOI MOSFETs
Author
de Souza, M. ; Kilchtyska, Valeriya ; Flandre, Denis ; Pavanello, Marcelo Antonio
Author_Institution
Dept. of Electr. Eng., Centro Univ. da FEI, São Bernardo do Campo, Brazil
fYear
2012
fDate
1-4 Oct. 2012
Firstpage
1
Lastpage
2
Abstract
This work reports, for the first time, experimental results of asymmetric self-cascode FD SOI n and pMOSFETs operating at liquid helium temperature. The results show that the improved analog performance obtained by this architecture at room temperature is maintained even for such extreme low temperature, promoting the reduction of impact ionization and parasitic bipolar effects, which may even be suppressed, depending on the threshold voltages of the devices. Although the use of A-SC may cause a small (5-10% for nMOS devices) decrease of the unit-gain frequency at certain bias conditions, the output conductance reduction in A-SC results in the rise of the intrinsic voltage gain that has shown to increase by up to 32 dB and 30 dB for A-SC n and pMOSFETs, respectively, in comparison to ST at 4.2K. The gain improvement at 4.2K has shown to be larger than at 300K at the same current level.
Keywords
MOSFET; ionisation; liquid helium; silicon-on-insulator; A-SC; asymmetric self-cascode FD SOI nMOSFET; fully depleted SOI technology; impact ionization reduction; intrinsic voltage gain; liquid helium temperature analog operation; nMOS devices; output conductance reduction; pMOSFET; parasitic bipolar effects; temperature 293 K to 298 K; temperature 4.2 K; unit-gain frequency; Degradation; Helium; MOSFETs; Semiconductor device measurement; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference (SOI), 2012 IEEE International
Conference_Location
NAPA, CA
ISSN
1078-621X
Print_ISBN
978-1-4673-2690-2
Electronic_ISBN
1078-621X
Type
conf
DOI
10.1109/SOI.2012.6404377
Filename
6404377
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