Title :
In vacuo measurement of the sensitivity limit of planar Bragg sensors
Author :
Parker, R.M. ; Gates, J.C. ; Sessions, N.P. ; Kundys, D.O. ; Gawith, C.B. ; Grossel, M.C. ; Smith, P.G.R.
Author_Institution :
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
Abstract :
We present the direct measurement and modeling of the sensitivity limit of an integrated refractive index sensor for the detection of molecular monolayers. Direct UV writing can be used to fabricate a wide range of integrated optical devices particularly Bragg gratings. These Bragg gratings are inherently sensitive to temperature and strain. By etching a portion of the cladding, the mode within the grating region can be exposed to an analyte. The spectral response of the grating provides information about the refractive index of the analyte.
Keywords :
Bragg gratings; etching; integrated optics; monolayers; optical fabrication; optical sensors; optical variables measurement; refractive index; spectral analysis; Bragg gratings; analyte refractive index information; cladding etching; direct UV writing; grating spectral response; in vacuo measurement; integrated optical device fabrication; integrated refractive index sensor; molecular monolayer detection; planar Bragg sensor sensitivity limit; strain sensitivity; temperature sensitivity; Bragg gratings; Etching; Optical refraction; Optical surface waves; Optical waveguides; Plasma measurements; Pollution measurement; Refractive index; Silicon compounds; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5196282
