DocumentCode
2863513
Title
Enhancement of laser nano-patterning of semiconductors: Direct ablation of PMMA coated silicon
Author
Klein-Wiele, J.-H. ; Simon, P.
Author_Institution
Laser-Lab. Gottingen e.V., Gottingen
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
Sub-micron patterning of silicon is demonstrated by direct femtosecond laser ablation. An enhancement of the ablation rate and a reduction of debris formation are achieved by covering the surface with a PMMA layer prior to ablation.
Keywords
high-speed optical techniques; laser ablation; nanopatterning; polymer films; PMMA coated silicon direct ablation; Si; femtosecond laser ablation; laser semiconductor nanopatterning; submicron patterning; Laser ablation; Optical device fabrication; Optical materials; Pulsed laser deposition; Semiconductor lasers; Silicon; Surface emitting lasers; Surface morphology; Ultrafast electronics; Ultrafast optics; 140.3390; 220.4000; 320.2250;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4627758
Filename
4627758
Link To Document