Deposition of Tungsten induced by femtosecond lasers

Author

Tang, Mingzhen ; Zhang, Haitao ; McCoy, Jerry ; Her, Tsing-Hua

Author_Institution

Dept. of Phys. & Opt., Univ. of North Carolina at Charlotte, Charlotte, NC

fYear

2006

fDate

21-26 May 2006

Firstpage

1

Lastpage

2

Abstract

We demonstrate Tungsten deposition on transparent substrates by 400-nm femtosecond-pulsed laser at room temperature. Deposition as functions of laser power, exposure time, and substrates was characterized. We found strong substrate dependence with circularly polarized light.

Keywords

chemical vapour deposition; high-speed optical techniques; light polarisation; pulsed laser deposition; substrates; tungsten; W; exposure time; femtosecond-pulsed laser deposition; laser polarization; laser power; multiphoton-absorption induced laser chemical vapor deposition; temperature 293 K to 298 K; transparent substrates; tungsten deposition; wavelength 400 nm; Chemical lasers; Laser ablation; Laser mode locking; Optical polarization; Power lasers; Pulsed laser deposition; Scanning electron microscopy; Silicon compounds; Tungsten; Ultrafast optics; (220.4000) Microstructure fabrication; (350.3390) Laser materials processing;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on

Conference_Location

Long Beach, CA

Print_ISBN

978-1-55752-813-1

Electronic_ISBN

978-1-55752-813-1

Type

conf

DOI

10.1109/CLEO.2006.4627760

Filename

4627760