DocumentCode
2865003
Title
UV laser-induced poling inhibition in lithium niobate crystals
Author
Ying, Y.J. ; Sones, C.L. ; Steigerwald, H. ; Johann, F. ; Soergel, E. ; Buse, K. ; Eason, R.W. ; Mailis, S.
Author_Institution
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
The development of methods for ferroelectric domain engineering in lithium niobate (LN) is of special importance as it not only enables the fabrication of efficient non-linear devices (PPLN) but also constitutes a very effective path towards micro-structuring of this important ferroelectric crystal. UV laser-induced poling inhibition is a process whereby domain inversion is prohibited as a result of previous UV laser irradiation of the crystal. The effect was first demonstrated using a frequency-doubled argon ion laser (244 nm) to irradiate the +z face of congruently melting undoped and MgO-doped LN single crystals followed by electric field poling. In that initial report the potential of the method for both, ferroelectric domain engineering and micro-structuring, was demonstrated.
Keywords
electric domains; laser beam effects; lithium compounds; UV laser irradiation; UV laser-induced poling inhibition; domain inversion; electric field poling; ferroelectric crystal; ferroelectric domain engineering; frequency-doubled argon ion laser; lithium niobate crystals; nonlinear devices; wavelength 244 nm; Chemical lasers; Crystals; Etching; Ferroelectric materials; Focusing; Laser transitions; Lithium niobate; Optical device fabrication; Power lasers; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5196475
Filename
5196475
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