• DocumentCode
    2865026
  • Title

    Accuracy considerations for dielectric measurements of semiconductor wafers using free space microwave measurement system in 8-13 GHz range

  • Author

    Baba, Noor Hasimah ; Awang, Zaiki ; Ghodgaonkar, Deepak K.

  • Author_Institution
    Microwave Technol. Centre, Universiti Teknologj MARA, Selangor, Malaysia
  • fYear
    2004
  • fDate
    5-6 Oct. 2004
  • Firstpage
    177
  • Lastpage
    181
  • Abstract
    An algorithm using only transmission measurements to calculate the complex permittivity of p-type and n-type silicon semiconductor wafers using a spot-focused free-space measurement system was developed. The dielectric constant obtained was close to published values for silicon wafers. The errors associated with the measurement of the complex permittivity values are discussed, and comparisons between the measured and calculated magnitude and phase of the forward reflection and transmission coefficients are presented. In this method, the free-space reflection and transmission coefficients, S11 and S21, are measured for a silicon wafer sandwiched between two teflon plates which are quarter-wavelength at midband. The actual reflection and transmission coefficient, S11 and S21 of the silicon wafers are then calculated from the measured S11 and S21 by using ABCD matrix transformation in which the complex permittivity and thickness of the teflon plates are known. Results are reported in the frequency range of 8-12.5 GHz.
  • Keywords
    dielectric measurement; matrix algebra; measurement errors; microwave measurement; 8 to 13 GHz; ABCD matrix transformation; Si; complex permittivity measurements; forward reflection coefficients; free space microwave measurement system; measurement errors; semiconductor wafer dielectric measurements; spot-focused free-space system; teflon plate sandwiched wafer; transmission coefficients; Dielectric constant; Dielectric measurements; Extraterrestrial measurements; Frequency; Microwave measurements; Permittivity measurement; Phase measurement; Reflection; Silicon; Thickness measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    RF and Microwave Conference, 2004. RFM 2004. Proceedings
  • Print_ISBN
    0-7803-8671-X
  • Type

    conf

  • DOI
    10.1109/RFM.2004.1411103
  • Filename
    1411103