• DocumentCode
    2866397
  • Title

    Technology assessment of commercially available critical area extraction tools

  • Author

    Long, Christopher ; Maynard, Daniel ; Bjornsen, M.A.

  • Author_Institution
    SEMATECH, Austin, TX, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    76
  • Lastpage
    82
  • Abstract
    In the 1990s, the semiconductor industry witnessed a philosophical change in the subject of modeling wafer final test yields. The calculation of average faults per chip has been historically calculated as the product of chip area and fault density, and often incorrectly referred to as defect density. For more than 20 years, several pioneering researchers, representing both academia and industry, have advocated a more accurate estimation of average faults per chip by using critical area, a better metric of chip sensitivity to defect mechanisms. The implementation of this concept requires sophisticated software tools that interrogate the physical design data. At the request of the member companies, International SEMATECH launched a study in 1999 of four commercially available critical area extraction (CAE) tools, with a primary objective of providing an independent technical assessment of capability, performance, accuracy, ease of use, features, and other distinguishing characteristics. Each of the tools were run on several product designs from Agilent Technologies and IBM Microelectronics. The CAE tools were all installed and evaluated at a common member company location, and each of the tool suppliers were visited, providing detailed visibility into the supplier´s environment. This paper will review the evaluation methodology, and summarize the findings and results of this International SEMATECH sponsored study
  • Keywords
    computer aided engineering; integrated circuit testing; integrated circuit yield; production testing; semiconductor process modelling; Agilent Technologies; CAE tools; IBM Microelectronics; International SEMATECH; chip area; critical area extraction tools; defect density; defect mechanisms; evaluation methodology; fault density; semiconductor industry; wafer final test yields; Algorithm design and analysis; Computer aided engineering; Data mining; Electronics industry; Microelectronics; Rivers; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor device testing; USA Councils;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5921-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2000.902562
  • Filename
    902562