DocumentCode
286806
Title
Fabrication and replication of continuous-relief DOEs
Author
Gale, M.T. ; Rossi, M. ; Schütz, H.
Author_Institution
Paul Scherrer Inst., Villigen, Switzerland
fYear
1993
fDate
13-15 Sep 1993
Firstpage
66
Lastpage
70
Abstract
Progress in the fabrication of continuous-relief Diffractive Optical Elements (DOEs) by laser beam writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of microoptical elements to be fabricated, including kinoform elements and general microrelief phase structures for a variety of applications in optical systems. Replicas are produced in polymer foil, as well as in thin epoxy films on glass substrates, using Ni shims generated from the recorded microrelief structures. The continuous relief microoptical elements offer an interesting alternative to multilevel `binary´ optical elements, in many cases with improved performance and lower cost
Keywords
computer-generated holography; holographic gratings; optical workshop techniques; photolithography; polymer films; Ni shims; continuous-relief diffractive optical elements; fabrication; glass substrates; kinoform elements; laser beam writing; microoptical elements; microrelief phase structures; photoresist; polymer foil; replication; thin epoxy films;
fLanguage
English
Publisher
iet
Conference_Titel
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location
Neuchatel
Print_ISBN
0-85296-578-8
Type
conf
Filename
263319
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