• DocumentCode
    286806
  • Title

    Fabrication and replication of continuous-relief DOEs

  • Author

    Gale, M.T. ; Rossi, M. ; Schütz, H.

  • Author_Institution
    Paul Scherrer Inst., Villigen, Switzerland
  • fYear
    1993
  • fDate
    13-15 Sep 1993
  • Firstpage
    66
  • Lastpage
    70
  • Abstract
    Progress in the fabrication of continuous-relief Diffractive Optical Elements (DOEs) by laser beam writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of microoptical elements to be fabricated, including kinoform elements and general microrelief phase structures for a variety of applications in optical systems. Replicas are produced in polymer foil, as well as in thin epoxy films on glass substrates, using Ni shims generated from the recorded microrelief structures. The continuous relief microoptical elements offer an interesting alternative to multilevel `binary´ optical elements, in many cases with improved performance and lower cost
  • Keywords
    computer-generated holography; holographic gratings; optical workshop techniques; photolithography; polymer films; Ni shims; continuous-relief diffractive optical elements; fabrication; glass substrates; kinoform elements; laser beam writing; microoptical elements; microrelief phase structures; photoresist; polymer foil; replication; thin epoxy films;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Holographic Systems, Components and Applications, 1993., Fourth International Conference on
  • Conference_Location
    Neuchatel
  • Print_ISBN
    0-85296-578-8
  • Type

    conf

  • Filename
    263319