DocumentCode
286808
Title
Shape distortion of diffractive optical elements, directly written with electron beam lithography
Author
Nikolajeff, F. ; Ekberg, M. ; Larsson, Mats ; Bengtsson, J. ; Härd, S.
Author_Institution
Chalmers Univ. of Technol., Goteborg, Sweden
fYear
1993
fDate
13-15 Sep 1993
Firstpage
60
Lastpage
61
Abstract
It has previously been shown that the relief depth can be accurately adjusted by repeated development. The present authors used repeated development to study the relief shape as a function of development time for a blazed grating structure exposed in a thick, ~8 μm, resist layer. The shape was obtained from measured diffraction data. This shape determining method appears to have a better accuracy than stylus measurements
Keywords
computer-generated holography; electron beam lithography; holographic gratings; optical workshop techniques; blazed grating structure; development time; diffractive optical elements; directly written; electron beam lithography; positive electron resist; relief shape; repeated development; resist kinoforms; shape distortions;
fLanguage
English
Publisher
iet
Conference_Titel
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location
Neuchatel
Print_ISBN
0-85296-578-8
Type
conf
Filename
263321
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