DocumentCode
2868619
Title
Study of two-photon laser photolithography with SU-8 at cryogenic temperatures
Author
Lee, K.H. ; Green, A.M. ; Brossard, F.S.F. ; Taylor, R.A. ; Sharp, D.N. ; Turberfield, A.J. ; Williams, D.A. ; Briggs, G.A.D.
Author_Institution
Dept. of Phys., Univ. of Oxford, Oxford
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters.
Keywords
cryogenics; laser materials processing; low-temperature production; micromechanical devices; photolithography; photoresists; two-photon processes; SU-8 epoxy resist; cryogenic temperatures; optical spectroscopy; temperature 4 K; two-photon absorption; two-photon laser photolithography; Absorption; Cryogenics; Laser theory; Lithography; Optical films; Optical pulses; Resists; Spectroscopy; Temperature; Tungsten; 190.4180 Multiphoton processes; 220.3740 Lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628072
Filename
4628072
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