DocumentCode
2873993
Title
Micro patterning of fluorescent nanoparticles by atomizers combined with electrostatic deposition and stencil mask
Author
Kim, Joon-Wan ; Yamagata, Yutaka ; Kim, Beomjoon ; Higuchi, Toshiro
fYear
2004
fDate
2004
Firstpage
625
Lastpage
628
Abstract
As a method to fabricate micro pattern of nanoparticles, this paper presents a new method based on atomizers combined with electrostatic deposition and stencil mask. The system consists of an atomizer, a stencil mask, and electrostatic field generator for collecting particles. Electrospray and SAW atomizer were utilized as atomizers and SiN stencil mask was fabricated. 2 μm patterning was possible. The research showed the possibility of nano patterning.
Keywords
masks; molecular biophysics; nanoparticles; photoresists; silicon compounds; spray coating techniques; surface acoustic waves; 2 micron; SAW atomizer; SiN; atomizers; electrospray; electrostatic deposition; electrostatic field generator; fluorescent nanoparticles; micro patterning; stencil mask; surface acoustic waves; Atomic layer deposition; Biological materials; Conducting materials; Electrostatic discharge; Fluorescence; Nanoparticles; Organic materials; Solvents; Thermal force; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN
0-7803-8265-X
Type
conf
DOI
10.1109/MEMS.2004.1290662
Filename
1290662
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