Non-electrical-contact LSI failure analysis using non-bias laser terahertz emission microscope

Author

Nikawa, Kiyoshi ; Yamashita, Masatsugu ; Matsumoto, Toru ; Otani, Chiko ; Tonouchi, Masayoshi ; Midoh, Yoshihiro ; Miura, Katsuyoshi ; Nakamae, Koji

Author_Institution

Grad. Sch. of Inf. Sci. & Technol., Osaka Univ., Suita, Japan

fYear

2011

fDate

4-7 July 2011

Firstpage

1

Lastpage

5

Abstract

We have developed the laser terahertz emission microscope that does not require Vdd-biasing and signal input: NB (non-bias)-LTEM. The NB-LTEM, also, does not require signal output via electrodes. In this paper, first of all, the position of non-electrical contact tools, in failure analysis, is show. Secondary, the basic concept and the system schematic of the NB-LTEM are described. Thirdly, how to use the NB-LTEM in fault localization is explained. Then, some examples of fault localization or defect detection using the NB-LTEM are shown. Finally, we would like to compare the NB-LTEM and the other non-electrical contact tool (L-SQ, laser SQUID microscope).

Keywords

failure analysis; large scale integration; optical microscopy; defect detection; failure analysis; fault localization; nonbias laser terahertz emission microscopy; nonelectrical contact tools; nonelectrical-contact LSI; Acoustic beams; Failure analysis; Large scale integration; Laser beams; Laser theory; Microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Physical and Failure Analysis of Integrated Circuits (IPFA), 2011 18th IEEE International Symposium on the

Conference_Location

Incheon

ISSN

1946-1542

Print_ISBN

978-1-4577-0159-7

Electronic_ISBN

1946-1542

Type

conf

DOI

10.1109/IPFA.2011.5992751

Filename

5992751